【类金刚石薄膜及改性研究】程宇航.pdf

DissertationSubmitted to HuazhongUniversityofScienceandTechnologyforthe DegreeofDoctorofPhilosophyinEngineering InvestigationofDiamondLikeCarbonfilms anditsModification Ph.D.Candidate:ChengYuhang Major:Metallic Materials and Heat Treatment Supervisor:Prof.Sun Peizhen,prof.Xie Changsheng Ass.

华中理工大学博山宁三治文力导致薄膜起皱,发现两种新型应力释放花样,用薄壳理论对此进行了很好的解释.用射频-直流等离子体增强化学气相沉积法采用C2H2、N2和Ar气的混合气体制备出高质量的a-C:H(N)薄膜.用多种分析测试手段研究了a-C:H(N)薄膜的结构,发现a-C:H(N) 薄膜是一种非晶态CN薄膜,其中存在短程和中程有序结构.薄膜中N含量可达9at .薄膜中碳氢原子主要以CH2基的形式存在.薄膜中掺N有助于提高spCH2基含量,降低 spCH2基和H原子的含量.

华中理工大学博士学法论文 and sp2CH,but mainly as sp3CH2.It is alsofound that the structure is sensitive to the deposition process.Increasingbiasvoltage orArcontent will lead to thedecrease of sp3/sp2ratio,Hcontent, polymeric component,and disorder degree,and the increase of sp2CH.